Nano Imprint Lithography (NIL) Methods

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Table of contents

CHAPTER 1: NANO-IMPRINT LITHOGRAPHY PROCESSING OF INORGANIC-BASED MATERIALS 
1. Generalities 
1.1. Nanofabrication techniques and Nano Imprint Lithography (NIL)
2. Nano Imprint Lithography (NIL) Methods
2.1. UV-NIL
2.2. Thermal NIL
2.3. Direct printing
3. Applications 
3.1. Photonic Crystals
3.2. Solar cells
3.4. Sensors
3.5. Anti-reflection coatings
5. References 
CHAPTER 2: METHYLATED SILICA SURFACES HAVING TAPERED NIPPLE-DIMPLE NANO PILLAR MORPHOLOGIES AS ROBUST, BROAD-ANGLE, AND BROADBAND ANTI-REFLECTION COATINGS
1. Introduction
2. Experimental part
2.1. Thin-film Methylated silica (Si4O7Me2) preparation
2.2. Preparation of the nanopatterned ARC morphologies by environmental control T-NIL
3. Optical performance 
3.1. Abrasion resistance
3.2. Thermal resistance
3.3. Chemical resistance
4. Conclusion
5. References
CHAPTER 3: SOL-GEL TIO2 NANOIMPRINTED METASURFACE COMBINED TO HYBRID SILICA SENSITIVE LAYERS WITH HIGH REFRACTIVE INDEX SENSITIVITY AND SELECTIVITY FOR GAS SENSING
1. Introduction
2. Experimental section
2.1. Preparation of hybrid-silica (H-SiO2) sensitive plain coatings
2.2. Investigation of gas adsorption in the plain sensitive layer
2.3. Preparation of H-SiO2/TiO2 nanostructured composite system by environmental control T-NIL 3. Specular reflection of nanostructured sensitive layer composite systems 
CHAPTER 4: 2D AND 3D (NANOSTRUCTURED PATTERNS) MULTI-STACK TIO2 COMBINED WITH LOW REFRACTIVE INDEX MESOPOROUS METHYLATED SILICA THIN FILM BY SOL GEL CHEMISTRY AND NANO IMPRINT LITHOGRAPHY
1. Introduction 
2. Experimental section
2.1. Investigation of multi-stack thin films of mesoporous methylated silica and dense titania
2.2. Fabrication of 3D double-stack super-imposed nanopatterns by replication of TiO2 nanostructures combined with meso-MS thin layer by pressure and environmental control T-NIL
3. Optical investigation