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Table of contents
Chapter 1 Introduction
1.1 General introduction
1.2 Ferromagnetic shape memory effect
1.3 Bulk NiMnGa Heusler alloys
1.3.1 Phase constituents and their crystal structures of NiMnGa alloys
1.3.2 Twin boundaries of martensites in NiMnGa alloys
1.3.3 Orientation relationship between martensite variants in NiMnGa alloys
1.3.4 Orientation relationship governing martensitic transformation
1.4 NiMnGa thin films
1.4.1 Fabrication process
1.4.2 Phase constituent, microstructural and crystallographic features
1.5 Content of the present work
Chapter 2 Experimental and crystallographic calculation
2.1 Sample preparation
2.1.1 Preparation of sputtering target
2.1.2 Thin film deposition
2.2 Characterization
2.2.1 X-ray diffraction
2.2.2 SEM and SEM-EBSD
2.2.3 TEM
2.3 Crystallographic calculations
2.3.1 Fundaments and definitions
2.3.2 Determination of orientation relationships
2.3.3 Displacement gradient tensor
Chapter 3 Fabrication of NiMnGa thin films
3.1 Introduction
3.2 Experimental procedure
3.3 Results
3.3.1 Influence of sputtering parameters and post annealing
3.3.2 Influence of substrate temperature and seed layer on the epitaxial thin films
3.3.3 Influence of film composition and thickness
3.4 Discussion
3.5 Summary
Chapter 4 Determination of crystal structure and crystallographic features by XRD
4.1 Introduction
4.2 Experimental
4.3 Results and discussion
4.3.1 Determination of crystal structure
4.3.2 Determination of crystallographic texture
4.4 Summary
Chapter 5 Determination of crystallographic features of epitaxial NiMnGa thin films by EBSD
5.1 Introduction
5.2 Experimental procedure
5.3 Results
5.3.1 Microstructure of epitaxial NiMnGa thin films
5.3.2 Crystallographic features of NM martensite
5.3.3 Crystallographic features of 7M martensite
5.3.4 Crystallography and sequence of martensitic transformation
5.4 Summary
Chapter 6 Conclusions
6.1 Conclusions
Bibliography
