Physical vapour deposition

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Table of contents

1 Introduction 
2 Transparent conducting oxides 
2.1 Physical properties of TCOs
2.2 Applications of TCOs
2.3 Properties of zinc oxide
2.4 Deposition methods for AZO thin films
3 The sputter deposition process 
3.1 Basics of plasma physics
3.2 Sputtering interactions
3.3 Magnetron sputtering
3.4 Reactive magnetron sputtering
3.5 High power impulse magnetron sputtering
3.6 Thin film growth
3.7 Sputter deposition of AZO thin films
3.8 Experimental setup
4 Characterization methods 
4.1 Spectrophotometry
4.2 Photoluminescence spectroscopy
4.3 Electrical characterization
4.4 X-ray diffraction
4.5 Scanning electron microscopy
4.6 Transmission electron microscopy
4.7 Secondary ion mass spectrometry
4.8 Rutherford backscattering spectrometry
4.9 X-ray photoelectron spectroscopy
5 Summary of the results 
6 Contributions and future work

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